DocumentCode
937411
Title
Field-dependence of the area-density of ´cold´ electron emission sites on broad-area CVD diamond films
Author
Xu, N.S. ; Latham, R.V. ; Tzeng, Ying-Shuen
Author_Institution
Dept. of Electron. Eng. & Appl. Phys., Aston Univ., Birmingham, UK
Volume
29
Issue
18
fYear
1993
Firstpage
1596
Lastpage
1597
Abstract
A high area density of field-induced electron emission sites has been observed on broad-area (12 mm in diameter) CVD diamond films deposited on molybdenum substrates. Furthermore, it was found that the density increased with the electric field applied to the surface of the films. These findings indicate that the CVD diamond film has to be seen as a potentially favoured candidate among electronic materials for the development of new types of cold cathode electron source.
Keywords
CVD coatings; diamond; electron field emission; semiconductor thin films; 12 mm; C; Mo substrate; area-density; broad-area CVD diamond films; cold electron emission sites; field-induced electron emission sites;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19931063
Filename
233063
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