• DocumentCode
    938060
  • Title

    Analysis of multicomponent thin films on GaAs by anodic processes

  • Author

    El-Safti, A.F.A.B. ; Weiss, B.L. ; Hartnagel, H.L.

  • Author_Institution
    University of Newcastle upon Tyne, Department of Electrical & Electronic Engineering, Newcastle upon Tyne, UK
  • Volume
    12
  • Issue
    13
  • fYear
    1976
  • Firstpage
    322
  • Lastpage
    324
  • Abstract
    Results arc presented which show that Ge ions diffuse to the surface rather than the OH¿ ions diffusing into the sample during the anodisation of Ge and Al on GaAs. Anodisatiort has also been used to show the growth of GaAs during the alloying of t.f.e. ohmic contacts to GaAs.
  • Keywords
    III-V semiconductors; gallium arsenide; semiconductor device manufacture; thin films; GaAs; Ge ions; OH- ions; anodic processes; anodisation; multicomponent thin films;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19760247
  • Filename
    4239826