DocumentCode
938972
Title
CoZrRe amorphous film heads for high-density magnetic recording
Author
Nishimura, C. ; Yanagisawa, K. ; Tago, A. ; Kishigami, J.
Author_Institution
NTT Appl. Electron. Lab., Tokyo, Japan
Volume
25
Issue
5
fYear
1989
fDate
9/1/1989 12:00:00 AM
Firstpage
3683
Lastpage
3685
Abstract
CoZrRe amorphous film heads with superior performance have been developed for use in high-density magnetic recording. These films produce near-zero magnetostriction of less than +2.5×10-7 and saturation magnetization of 1.2 T. It is found that the addition of a small amount of Re to CoZr markedly improves the stability of magnetic properties during head fabrication. However, the process temperature must be less than 200°C. To realize the required temperature, a dry process is developed, using sputtered SiO2 films for insulation instead of conventional hard-cured photoresist. A maximum process temperature of about 150°C is obtained As a result, a high linear density of more than 2100 fr/mm (53 kfci) at a spacing of 0.1 μm is achieved using CoZrRe film heads and metal-sputtered media with a coercivity of 1300 Oe
Keywords
amorphous state; cobalt alloys; magnetic heads; magnetic recording; magnetic thin film devices; magnetisation; rhenium alloys; sputter deposition; sputtered coatings; zirconium alloys; 150 degC; CoZrRe amorphous film heads; dry process; head fabrication; high-density magnetic recording; insulation; magnetic heads; maximum process temperature; metal-sputtered media; near-zero magnetostriction; saturation magnetization; sputtered SiO2 films; Amorphous materials; Fabrication; Magnetic films; Magnetic heads; Magnetic properties; Magnetic recording; Magnetostriction; Saturation magnetization; Stability; Temperature;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.42400
Filename
42400
Link To Document