Title :
Pulse shaping by laser-excited solid-state plasmas in silicon
Author_Institution :
Universitÿt Erlangen-Nÿrnberg, Institut fÿr Hochfrequenztechnik, Erlangen, West Germany
Abstract :
A new method for d.c. or r.f. pulse shaping by laser-excited solid-state plasmas in a silicon microstrip device is described. An analysis is given to precalculate the output pulse shape for special parameter settings. Theoretical and experimental results were found to agree fairly well.
Keywords :
laser beam applications; optoelectronic devices; photoconducting devices; pulse shaping circuits; semiconductor switches; solid-state microwave devices; solid-state plasma; strip line components; DC pulse shaping; RF pulse shaping; Si gap shunt microstrip structure; Si microstrip device; experimental results; high speed optoelectronic gating; laser excited solid state plasma in Si; microwave switch; optoelectronic pulse shaping; optoelectronic switch;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19760481
