• DocumentCode
    940680
  • Title

    High-T/sub c/ SNS junctions for multilevel integrated circuits

  • Author

    Ono, R.H. ; Vale, L.R. ; Kimminau, K.R. ; Beall, J.A. ; Cromar, M.W. ; Reintsema, C.D. ; Harvey, T.E. ; Rosenthal, P.A. ; Rudman, D.A.

  • Author_Institution
    Nat. Inst. of Stand. & Technol., Boulder, CO, USA
  • Volume
    3
  • Issue
    1
  • fYear
    1993
  • fDate
    3/1/1993 12:00:00 AM
  • Firstpage
    2389
  • Lastpage
    2392
  • Abstract
    High-quality superconductor-normal metal-superconductor (SNS) Josephson microbridges have been fabricated in a variety of configurations across the edge of steps in a manner that is consistent with a multilevel integrated circuit process. The best junctions have critical current-resistance products of 1-3 mV at 4 K and 100-500 mu V at 77 K, useful values for many analog and digital applications not requiring hysteretic junctions. The DC transport characteristics of the junctions and issues of reproducibility and uniformity are discussed. In particular, a simple theoretically based analysis of junction parameter spread is presented.<>
  • Keywords
    Josephson effect; SQUIDs; atomic force microscopy; barium compounds; high-temperature superconductors; pulsed laser deposition; superconducting integrated circuits; superconducting thin films; yttrium compounds; 1 to 3 mV; 100 to 500 muV; 4 K; 77 K; AFM image; DC transport characteristics; SNS Josephson microbridges; SQUID; YBa/sub 2/Cu/sub 3/O/sub 7-x/ junction; critical current-resistance products; edge steps technique; high temperature superconductor; junction parameter spread; multilevel integrated circuit process; pulsed laser deposition; reproducibility; superconductor-normal metal-superconductor; Atomic force microscopy; Conductivity; Etching; Insulation; Niobium; Optical device fabrication; Pulsed laser deposition; Resists; Scanning electron microscopy; Substrates;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/77.233421
  • Filename
    233421