Title :
Nanofabrication based on MEMS technology
Author :
Wang, Yuelin ; Li, Xinxin ; Li, Tie ; Yang, Heng ; Jiao, Jiwei
Author_Institution :
Shanghai Inst. of Microsyst. & Inf. Technol., Chinese Acad. of Sci., Shanghai
fDate :
6/1/2006 12:00:00 AM
Abstract :
In this paper, a novel nanofabrication method that develops from the traditional microelectromechanical system (MEMS) technology of anisotropic etching, deep reaction ion etching, and sacrificial layer process has been reviewed based on our work. With such a technology, nano tips, nano wires, nano beams even nano devices can be fabricated in a batch process. Beams with thickness of only 12 nm, a nano tip with a heater on the beam, and a nano wire whose width and thickness is only 50 nm are demonstrated. The scale effect of the Young´s modulus of silicon has been observed and the nano-electronic-mechanical data storage has been presented
Keywords :
digital storage; micromechanical devices; nanotechnology; 12 nm; 50 nm; MEMS; Young modulus; anisotropic etching; deep reaction ion etching; microelectromechanical system; nanobeams; nanodevices; nanoelectromechanical data storage; nanoelectromechanical system; nanofabrication; nanotips; nanowires; sacrificial layer process; Anisotropic magnetoresistance; Atomic force microscopy; Dry etching; Lithography; Micromechanical devices; Nanoelectromechanical systems; Nanofabrication; Scanning electron microscopy; Silicon; Wet etching; Microelectromechanical system (MEMS); nanoelectromechanical system (NEMS); nanofabrication;
Journal_Title :
Sensors Journal, IEEE
DOI :
10.1109/JSEN.2006.874034
