DocumentCode
941654
Title
Low-Loss Thin Film Microstrip Lines and Filters Based on Magnetorheological Finishing
Author
Lee, Sang-No ; Lee, Joon-Ik ; Kim, Yong-Jun ; Yook, Jong-Gwan
Author_Institution
Yonsei Univ., Seoul
Volume
30
Issue
4
fYear
2007
Firstpage
849
Lastpage
854
Abstract
This paper presents a surface finishing method based on magnetorheological fluid to obtain low-loss high-frequency transmission lines and filters on CMOS-grade silicon. As specimens for the magnetorheological finishing, high- and low- thin film microstrip lines with a 20 m-thick polyimide interface above the ground plane that is patterned on the silicon substrate are evaluated. In all cases, thin film microstrip lines treated with the magnetorheological finishing scheme reveal much lower losses compared to original lines owing to reduced conductor roughness. In addition, low-pass filters with 0.5 dB Chebyshev responses based on high-Z0 and low-Z0 thin film microstrip lines are designed and characterized before and after applying the magnetorheological finishing treatment, exhibiting a roughly 1.0-dB insertion loss improvement for the entire pass band range. The proposed magnetorheological finishing scheme can be applied to smoothen any 3-D high-frequency structures, and it can significantly improve conductor roughness.
Keywords
magnetic fluids; magnetorheology; microstrip filters; microstrip lines; silicon; surface finishing; 3D high-frequency structures; CMOS-grade silicon; Si - Interface; high-frequency transmission lines; low-loss thin film; low-pass filters; magnetorheological finishing; magnetorheological fluid; microstrip filters; microstrip lines; polyimide interface; reduced conductor roughness; size 20 mum; surface finishing; CMOS-grade silicon; conductor roughness; magnetorheological finishing; magnetorheological fluid; thin film microstrip lines;
fLanguage
English
Journal_Title
Components and Packaging Technologies, IEEE Transactions on
Publisher
ieee
ISSN
1521-3331
Type
jour
DOI
10.1109/TCAPT.2007.906700
Filename
4358432
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