• DocumentCode
    9427
  • Title

    CMOS-Compatible Plasmonic Bragg Reflectors Based on Cu-Dielectric-Si Structures

  • Author

    Shiyang Zhu ; Hong-Son Chu ; Guo-Qiang Lo ; Dim-Lee Kwong

  • Author_Institution
    Dept. of Nano Electron. & Photonics, Inst. of Microelectron., Singapore, Singapore
  • Volume
    25
  • Issue
    21
  • fYear
    2013
  • fDate
    Nov.1, 2013
  • Firstpage
    2115
  • Lastpage
    2118
  • Abstract
    Cu-dielectric-Si hybrid plasmonic waveguide (HPW)-based plasmonic Bragg reflectors (PBRs) are fabricated on an SoI platform using standard CMOS technology and characterized in the 1515-1615-nm wavelength range. Optical stop-bands are experimentally observed, depending on the grating size and the number of grating periods. PBRs with 20 periods exhibit ~ -30-dB transmission within the stop-band, ~ -10-dB transmission outside the stop-band (both are normalized by the corresponding 2- μm-long straight HPW), steep band edges of ~ 0.92 dB/nm, and small ripples in the transmission spectra beyond the band edges, in agreement with those predicted from finite-difference-time-domain simulations. These favorable performances, together with ease fabrication and CMOS compatibility, make the proposed HPW-based PBRs useful for dense Si photonic integrated circuits.
  • Keywords
    Bragg gratings; CMOS integrated circuits; copper; finite difference time-domain analysis; integrated optics; plasmonics; silicon-on-insulator; CMOS-compatible plasmonic Bragg reflectors; Cu; Cu-dielectric-Si structures; Si; dense silicon photonic integrated circuits; finite-difference-time-domain simulations; grating periods; grating size; hybrid plasmonic waveguide; soI platform; standard CMOS technology; wavelength 1515 nm to 1615 nm; Dielectrics; Optical waveguides; Optimized production technology; Photonics; Plasmons; Propagation losses; Silicon; Bragg grating; CMOS compatibility; hybrid plasmonic waveguide; integrated photonics;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2013.2281995
  • Filename
    6600805