DocumentCode :
942900
Title :
InP-Langmuir-film m.i.s. structures
Author :
Roberts, G.G. ; Pande, K.P. ; Barlow, W.A.
Author_Institution :
University of Durham, Department of Applied Physics & Electronics, Durham, UK
Volume :
13
Issue :
19
fYear :
1977
Firstpage :
581
Lastpage :
583
Abstract :
The electrical properties of m.i.s. structures based on InP and Langmuir films have been investigated. A strongly inverted low-frequency-type C/V response occurs at about 30 Hz. Surface-state distributions have been evaluated by using both quasistatic and conductance techniques. Effective surface-state densities are found to be ~3 × 1011cm¿2 eV¿1 over a large fraction of the band gap.
Keywords :
III-V semiconductors; Langmuir films; capacitance; indium compounds; metal-insulator-semiconductor devices; surface electron states; C/V response; InP; Langmuir films; MIS structures; conductance techniques; quasistatic; surface state density;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19770415
Filename :
4240551
Link To Document :
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