• DocumentCode
    944616
  • Title

    High performance superconducting thin films on large area substrates

  • Author

    Lauder, A. ; Wilker, C. ; Kountz, D.J. ; Holstein, W.L. ; Face, D.W.

  • Author_Institution
    Du Pont Central Res. & Dev., Wilmington, DE, USA
  • Volume
    3
  • Issue
    1
  • fYear
    1993
  • fDate
    3/1/1993 12:00:00 AM
  • Firstpage
    1683
  • Lastpage
    1686
  • Abstract
    The first fabrication of 3-in-diameter, thin films of thallium-based superconductors is reported. (Tl/sub 0.5/Pb/sub 0.5/)Sr/sub 2/Ca/sub 2/Cu/sub 3/O/sub 9/ thin films on LaAlO/sub 3/ are found to display the best surface resistance (R/sub s/) properties of any superconductor at higher temperatures and show approximately 50* better performance than copper at 100 K and 10 GHz. A Tl/sub 2/Ba/sub 2/CaCu/sub 2/O/sub 8/ thin film, processed as a 1.8-m-long, 10- mu m-wide meander line carries about 1*10/sup 7/ A/cm/sup 2/ at 4.2 K and 2*10/sup 6/ A/cm/sup 2/ at 80 K. The thallium-based superconductors are compared to YBa/sub 2/Cu/sub 3/O/sub 7/ with respect to T/sub c/, R/sub s/, and Q.<>
  • Keywords
    annealing; barium compounds; high-temperature superconductors; lead compounds; sputter deposition; superconducting thin films; superconducting transition temperature; surface conductivity; thallium compounds; yttrium compounds; 1.8 m; 10 GHz; 100 K; 3 inch; 4.2 K; 80 K; LaAlO/sub 3/ substrate; RF magnetron sputtering; Tl/sub 0.5/-Pb/sub 0.5/Sr/sub 2/Ca/sub 2/Cu/sub 3/O/sub 9/; Tl/sub 2/Ba/sub 2/CaCu/sub 2/O/sub 8/; YBa/sub 2/Cu/sub 3/O/sub 7/; annealing; large area substrates; quality factor; superconducting thin films; surface resistance; Composite materials; Copper; Fabrication; High temperature superconductors; Substrates; Superconducting materials; Superconducting microwave devices; Superconducting thin films; Superconductivity; Surface resistance;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/77.233789
  • Filename
    233789