Title :
53 GHz-fmax Si/SiGe heterojunction bipolar transistors
Author :
Gruhle, A. ; Kibbel, H. ; Kasper, Erich
Author_Institution :
Daimler-Benz AG, Ulm
fDate :
11/1/1992 12:00:00 AM
Abstract :
Summary form only given. The authors report Si/SiGe HBTs (heterojunction bipolar transistors) with a base sheet resistance of only 680 Ω/□, leading to a measured fmax of 53 GHz. The complete layer structure was grown by MBE (molecular beam epitaxy), including the single-crystal emitter with no need for a poly-drive-in anneal. Devices were built on high-resistivity substrates with As-implanted and diffused buried layers. A double-mesa structure using a self-aligned base metallization with respect to the emitters was employed. On-wafer high-frequency measurements from 0.5 to 26 GHz showed transit frequencies between 40 and 50 GHz for devices with 1-3 μm wide emitter fingers. The reduced base sheet resistance compared to earlier devices led to a maximum available gain at 26 GHz for a 1×16 μm device of 6.3 dB corresponding to a record fmax=53 GHz
Keywords :
Ge-Si alloys; elemental semiconductors; heterojunction bipolar transistors; semiconductor materials; silicon; solid-state microwave devices; 0.5 to 53 GHz; 6.3 dB; As implanted layers; HBT; MBE; Si-SiGe; Si:As; diffused buried layers; double-mesa structure; heterojunction bipolar transistors; high-resistivity substrates; molecular beam epitaxy; self-aligned base metallization; single-crystal emitter; transit frequencies; Annealing; Electrical resistance measurement; Fingers; Frequency measurement; Germanium silicon alloys; Heterojunction bipolar transistors; Metallization; Molecular beam epitaxial growth; Silicon germanium; Substrates;
Journal_Title :
Electron Devices, IEEE Transactions on