DocumentCode :
945616
Title :
Nonvolatile semiconductor memory devices
Author :
Chang, Joseph Juifu
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume :
64
Issue :
7
fYear :
1976
fDate :
7/1/1976 12:00:00 AM
Firstpage :
1039
Lastpage :
1059
Abstract :
An attempt is made to survey and assess the nonvolatile semiconductor memory devices including charge-storage devices and FET´s with ferroelectric gate insulators. The charge-storage devices are further divided into two groups: 1) charges-trapping devices such as the MNOS and the MAOS, and 2) floating-gate devices such as the FAMOS and the DDC. Approaches for achieving virtual nonvolatility in otherwise volatile semiconductor memories are briefly disscused. Novel structures which provide nonvolatility as well as the theoretical limit of memory array density are also explored.
Keywords :
Application software; Batteries; Ferroelectric materials; Insulation; Magnetics; Nonvolatile memory; Random access memory; Semiconductor devices; Semiconductor memory; Silicon;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1976.10272
Filename :
1454541
Link To Document :
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