• DocumentCode
    946473
  • Title

    A new single electron transistor

  • Author

    Chou, Stephen Y. ; Wang, Yannan

  • Author_Institution
    Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN
  • Volume
    39
  • Issue
    11
  • fYear
    1992
  • fDate
    11/1/1992 12:00:00 AM
  • Firstpage
    2642
  • Abstract
    Summary form only given. The authors propose and demonstrate a novel single-electron transistor (SET) where the drain current is controlled by a single electron. This SET is similar to a GaAs-AlGaAs heterostructure modulation-doped FET, except that it has a split gate which electrostatically squeezes a 2-D channel into a 1-D channel, and it also has a nanoscale metal bar inside the gate gap to form a potential barrier in the 1-D channel. At certain gate voltages, a single electron can be `stopped´ inside the 1-D channel by the potential barrier, and due to Coulomb repulsion this electron `blocks´ the current flow from the source of the FET to the drain (Coulomb blockade). Therefore, the drain current of the SET will oscillate with the gate voltage, giving strong negative differential resistances, instead of being a linear function of gate voltage, as in a conventional FET operated in the linear regime
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; negative resistance; 1D channel; Coulomb repulsion; GaAs-AlGaAs heterostructure; MODFET; drain current; modulation-doped FET; nanoscale metal bar; negative differential resistances; potential barrier; single electron transistor; split gate; Electron mobility; Epitaxial layers; FETs; Germanium silicon alloys; Hall effect; Quantum well devices; Silicon germanium; Single electron transistors; Temperature distribution; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.163491
  • Filename
    163491