Title :
Line width control in electron-beam lithography
Author :
Phang, J.C.H. ; Ahmed, Hameeza
Author_Institution :
Cambridge University, Engineering Department, Cambridge, UK
Abstract :
A method for predicting line widths in electron beam lithography is described. Computer predictions of line dimension as a function of dose, and profile as a function of proximity to another line are compared with experimental results on 0.35¿m thick PMMA at a beam energy of 15 keV.
Keywords :
electron resists; integrated circuit technology; 15 keV beam energy; PMMA; electron beam lithography; line width control;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19780258
