DocumentCode
947240
Title
Damage-less dry etching of YBaCuO films under liquid nitrogen cooling (striplines)
Author
Akoh, H. ; Sato, H. ; Takada, S.
Author_Institution
Electrotechnical Lab., Ibaraki, Japan
Volume
3
Issue
1
fYear
1993
fDate
3/1/1993 12:00:00 AM
Firstpage
2990
Lastpage
2993
Abstract
A novel dry etching process has been developed to reduce etching damage for striplines of YBaCuO thin films in which samples are cooled by liquid nitrogen. The patterned striplines have widths ranging from 2 to 100 mu m and a length of 1 mm. The critical current density J/sub c/ at 77 K for striplines of
Keywords
barium compounds; critical current density (superconductivity); high-temperature superconductors; sputter etching; strip lines; superconducting microwave devices; superconducting thin films; yttrium compounds; 77 K; HTSC; YBaCuO thin films; critical current density; damage-less etching; dry etching process; liquid N/sub 2/ cooling; striplines; Anisotropic magnetoresistance; Cooling; Critical current density; Dry etching; Ion beams; Nitrogen; Sputter etching; Stripline; Superconducting films; Yttrium barium copper oxide;
fLanguage
English
Journal_Title
Applied Superconductivity, IEEE Transactions on
Publisher
ieee
ISSN
1051-8223
Type
jour
DOI
10.1109/77.234026
Filename
234026
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