Title :
Grating Couplers Fabricated by Electron-Beam Lithography for Coupling Free-Space Light Into Nanophotonic Devices
Author :
Masturzo, Scott A. ; Yarrison-Rice, Jan M. ; Jackson, Howard E. ; Boyd, Joseph T.
Author_Institution :
Cincinnati Univ., Cincinnati
Abstract :
Grating couplers with nanoscale periodicity have been fabricated on silicon-on-insulator (SOI) substrates by electron beam lithography and reactive ion etching. A versatile experimental apparatus has been implemented to measure the efficiency of these gratings in coupling free-space radiation into planar waveguides. This coupling efficiency has been measured as a function of grating depth and the angle and wavelength of incident radiation. Coupling efficiencies of at least 5% and as high as 20% are demonstrated for wavelengths in the vicinity of 1550 nm and incident angles around 45deg.
Keywords :
diffraction gratings; electron beam lithography; micro-optics; nanotechnology; optical couplers; optical fabrication; optical planar waveguides; sputter etching; coupling efficiency; electron-beam lithography; free-space light coupling; grating couplers; grating depth; nanophotonic devices; nanoscale periodicity; planar waveguides; reactive ion etching; silicon-on-insulator substrates; Coupling efficiency; SOI; coupling efficiency; grating; grating coupler; nanophotonic; nanotechnology; photonic; silicon; silicon SOI; telecommunications; waveguide;
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2007.907401
