• DocumentCode
    947594
  • Title

    InGaAs/GaAs planar doped barrier electron emitters

  • Author

    Jiang, W.N. ; Hashemi, Mahmood ; Mishra, Umesh K.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA
  • Volume
    39
  • Issue
    11
  • fYear
    1992
  • fDate
    11/1/1992 12:00:00 AM
  • Firstpage
    2649
  • Abstract
    Summary form only given. Emission from planar doped barrier (PDB) hot electron generators is demonstrated. The PDB structure consists of a sequence of n+-i-δ(p+)-i-n+ layers. The δ(p+) layer is fully depleted, giving rise to a triangular barrier. An applied bias V forward biases the n+-i-δ(p+) junction while reverse biasing the δ(p+)-i-n+ junction, much like the distribution of emitter-collector bias applied to a bipolar transistor with a fully depleted base. The reverse bias potential accelerates the electrons injected over the semiconductor barrier to a maximum kinetic energy determined by the applied potential. The final kinetic energy is lowered by scattering processes. The intrinsic efficiency of emission is therefore determined by quasi-ballistic transport across the acceleration region of the diode
  • Keywords
    III-V semiconductors; electron field emission; gallium arsenide; hot carriers; indium compounds; vacuum microelectronics; InGaAs-GaAs; PDB structure; acceleration region; fully depleted layer; hot electron generators; maximum kinetic energy; n+-i-δ(p+)-i-n+ layers; planar doped barrier electron emitters; quasi-ballistic transport; reverse bias potential; scattering processes; triangular barrier; Electrodes; Electron emission; Electron guns; Field emitter arrays; Gallium arsenide; Indium gallium arsenide; Kinetic energy; Semiconductor diodes; Silicon; Surface contamination;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.163504
  • Filename
    163504