Title :
High-speed InP/InGaAs p-n-p heterojunction bipolar transistors
Author :
Lunardi, L.M. ; Chandrasekhar, S. ; Hamm, R.A.
Author_Institution :
AT&T Bell Labs., Holmdel, NJ
fDate :
11/1/1992 12:00:00 AM
Abstract :
Summary form only given. The authors report InP/InGaAs p-n-p HBTs (heterojunction bipolar transistors), grown by metal-organic molecular beam epitaxy (MOMBE) and demonstrate large current gain and high speed. A transistor with an emitter dimension of 3×8 gmm2 had a common emitter current gain of 30 at a collector current density of 2×104 A/cm2. Microwave on-wafer measurements were done to characterize the small-signal performance of the transistors. The unity gain cutoff frequency fT was 12 GHz and the inferred maximum oscillation frequency fmax was 20 GHz, at a collector current of 2.5 mA and a collector-to-emitter voltage of 5.0 V
Keywords :
III-V semiconductors; chemical beam epitaxial growth; gallium arsenide; heterojunction bipolar transistors; indium compounds; semiconductor growth; solid-state microwave devices; 12 GHz; 2.5 mA; 20 GHz; 5 V; MOMBE; collector current; collector current density; collector-to-emitter voltage; common emitter current gain; current gain; heterojunction bipolar transistors; high speed; maximum oscillation frequency; metal-organic molecular beam epitaxy; microwave on wafer measurements; p-n-p HBTs; small-signal performance; unity gain cutoff frequency; Diodes; Doping; Electrons; Gold; Heterojunction bipolar transistors; Indium gallium arsenide; Indium phosphide; Molecular beam epitaxial growth; Scattering; Temperature distribution;
Journal_Title :
Electron Devices, IEEE Transactions on