DocumentCode
948210
Title
Current-voltage characteristics of in situ doped polycrystalline diamond field-effect transistors
Author
Plano, L.S. ; Dreifus, D.L.
Volume
39
Issue
11
fYear
1992
fDate
11/1/1992 12:00:00 AM
Firstpage
2666
Lastpage
2667
Abstract
Summary form only given. The authors report the first demonstration of a polycrystalline diamond (PCD) FET which exhibits saturation and pinchoff. The PCD material was grown by a microwave enhanced chemical vapor deposition technique. Following room-temperature characterization, the devices were tested at elevated temperatures in atmosphere. As the temperature was increased, the current level increased significantly. At a temperature of 150°C, the zero gate-bias drain-to-source current was -34 nA at -20 V and the channel resistance had dropped to 990 MΩ. The drain to source I - V characteristics were linear at this temperature. Gate voltages were applied in 8-V steps while the drain-to-source voltage was swept from 0 to -30 V. The I-V characteristics clearly showed evidence of saturation. Also, at applied gate biases in excess of 32 V, the active channel is pinched off. The peak transconductance at 150°C was 6.4 nS/mm. Device failure occurred at a temperature above 200°C and was due to failure of the gate oxide layer
Keywords
chemical vapour deposition; diamond; elemental semiconductors; insulated gate field effect transistors; 150 to 200 degC; 32 V; 6.4 nS; FET; I-V characteristics; MOS device; MOSFET; SiO2-C; chemical vapor deposition; field-effect transistors; gate oxide failure; in situ doping; peak transconductance; pinchoff; polycrystalline diamond; saturation; Atmosphere; Chemical vapor deposition; Current-voltage characteristics; Microwave FETs; Microwave devices; Microwave theory and techniques; Temperature; Testing; Transconductance; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.163536
Filename
163536
Link To Document