• DocumentCode
    948383
  • Title

    The phototransistor revisited: all-bipolar monolithic photoreceiver at 2 Gb/s with high sensitivity

  • Author

    Chandrasekhar, S. ; Gnauck, A.H. ; Hamm, R.A. ; Qua, G.J.

  • Author_Institution
    AT&T Bell Labs., Holmdel, NJ
  • Volume
    39
  • Issue
    11
  • fYear
    1992
  • fDate
    11/1/1992 12:00:00 AM
  • Firstpage
    2677
  • Lastpage
    2678
  • Abstract
    Summary form only given. The authors revisit the three-terminal phototransistor and demonstrate the application of the HPT (heterojunction phototransistor) at 2 Gb/s in an all-bipolar monolithic photoreceiver. They also show a performance comparable to the best p-i-n photoreceiver. The phototransistors were fabricated from epitaxial layers grown by metal-organic molecular beam epitaxy on a Fe-doped semi-insulating InP substrate. The phototransistor had a small-signal electrical current gain between 150 and 200. The quantum efficiency of the base-collector photodiode was 40%. Microwave on-wafer measurements yielded a unity current gain cutoff frequency of 30 GHz and a maximum oscillation frequency of 20 GHz at a collector current of 5.0 mA. The small-signal frequency response of the packaged monolithic photoreceiver indicated a 3-dB bandwidth of 1.1 GHz, at a wavelength of 1.53 μm, with no peaking in the response
  • Keywords
    bipolar integrated circuits; heterojunction bipolar transistors; integrated optoelectronics; optical receivers; phototransistors; 1.1 GHz; 1.53 micron; 2 Gbit/s; 20 GHz; 3-dB bandwidth; 30 GHz; 5 mA; InP:Fe substrate; all-bipolar monolithic photoreceiver; collector current; epitaxial layers; heterojunction phototransistor; high sensitivity; maximum oscillation frequency; metal-organic molecular beam epitaxy; microwave on wafer measurements; small-signal electrical current gain; small-signal frequency response; three-terminal phototransistor; unity current gain cutoff frequency; Current measurement; Cutoff frequency; Epitaxial layers; Heterojunctions; Indium phosphide; Microwave measurements; Molecular beam epitaxial growth; PIN photodiodes; Phototransistors; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.163553
  • Filename
    163553