DocumentCode
948467
Title
Strain-induced effects on the performance of AlGaInP visible lasers
Author
Hashimoto, Jun-ichi ; Katsuyama, Tsukuru ; Yoshida, Ichiro ; Hayashi, Hideki
Author_Institution
Sumitomo Electric Ind. Ltd., Kanagawa, Japan
Volume
29
Issue
6
fYear
1993
fDate
6/1/1993 12:00:00 AM
Firstpage
1863
Lastpage
1868
Abstract
The strain-induced reduction of the threshold current density (J th) of AlGaInP visible lasers was investigated. Strained multiple-quantum-well (SMQW) and unstrained MQW AlGaInP broad contact lasers were fabricated using low-pressure organometallic vapor phase epitaxy (OMVPE). To evaluate the strain-induced effects, AlGaInP compressively strained quantum wells were introduced into the active region of the SMQW laser, making the energy band structure of the SMQW laser almost the same as that of the MQW one. Comparing the J th of both lasers at the same lasing wavelength showed that, for cavity lengths between 300 and 700 μm, more than a 4% decrease in J th was obtained by incorporating the SMQW structures, and the maximum reduction of 6% was achieved at 500 μm. In addition, it was shown that, in the SMQW laser, the considerable decrease in the transparency current density J 0 contributes effectively toward J th reduction
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; indium compounds; laser beams; optical workshop techniques; semiconductor lasers; vapour phase epitaxial growth; 300 to 700 micron; AlGaInP; OMVPE; active region; broad contact lasers; compressively strained quantum wells; energy band structure; low-pressure organometallic vapor phase epitaxy; multiple quantum well lasers; semiconductor lasers; strain-induced effects; threshold current density; transparency current density; visible lasers; Current density; Diode lasers; Epitaxial growth; Gallium arsenide; Light sources; Optical recording; Performance evaluation; Quantum well devices; Quantum well lasers; Threshold current;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/3.234445
Filename
234445
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