Title :
Twin-transverse-junction stripe laser with linear light/current characteristic and low threshold
Author :
Thompson, G.H.B. ; Lovelace, D.F. ; Turley, S.E.H.
Author_Institution :
Standard Telecommunication Laboratories Limited, Harlow, UK
Abstract :
Lateral confinement of both light and carriers in the active region is achieved by creating twin transverse junctions with a deep Zn diffusion. The source is a stripe of SiO2 from which the Zn is diffused at low concentration into a highly n-doped double-heterostructure wafer. Threshold currents of around 30¿40 mA have been measured and near and far fields of typically 3 ¿m and 10°, respectively, have been observed (both to half intensity). The optical control achieved results in linear light/current characteristics and zero-order-mode operation.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; semiconductor junction lasers; (GaAl)As/GaAs stripe laser; 10 degree beamwidth; 3 micron near field beam width; 30 to 40 mA threshold currents; deep Zn diffusion; highly n-doped DH stripe laser; linear light/current characteristics; low threshold; twin transverse junction stripe laser;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19790097