DocumentCode :
949935
Title :
Modeling the contribution of diffusion to device-upset cross sections
Author :
Patterson, J.D. ; Edmonds, L.D.
Author_Institution :
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
Volume :
49
Issue :
6
fYear :
2002
fDate :
12/1/2002 12:00:00 AM
Firstpage :
3067
Lastpage :
3074
Abstract :
A novel technique for determining the diffusion-charge collection-efficiency function Ωτ (x&oarr;), which incorporates mixed-boundary conditions and carrier recombination, is presented and applied to a realistic three-dimensional memory device to obtain the upset cross section a as a function of linear energy transfer (LET) and orientation of incidence. The model is able to reproduce experimental measurements and can be used to more accurately predict or across regimes where little data exists. This will allow for the determination of more precise errors rates while simultaneously requiring fewer experimental data points.
Keywords :
DRAM chips; electron-hole recombination; integrated circuit modelling; ion beam effects; DRAM; analytical model; angular dependence; carrier recombination; diffusion-charge collection-efficiency function; error rate; heavy ion irradiation; linear energy transfer; mixed-boundary conditions; three-dimensional memory device; upset cross-section; Boundary conditions; Energy exchange; Error analysis; Physics; Poisson equations; Predictive models; Propulsion; Radiative recombination; Random access memory; Space technology;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2002.805442
Filename :
1134262
Link To Document :
بازگشت