DocumentCode
951751
Title
Electrical Characteristics of Copper/Polyimide Thin-Film Multilayer Interconnects
Author
Lane, Thomas A. ; Belcourt, Frank J. ; Jensen, Ronald J.
Author_Institution
Honeywell Physical Sciences Center,Bloomington
Volume
10
Issue
4
fYear
1987
fDate
12/1/1987 12:00:00 AM
Firstpage
577
Lastpage
585
Abstract
A multilayer substrate Containing two-chip emitter-coupled logic (ECL) ring oscillator circuits was fabricated and tested to determine the static and dynamic electrical characteristics of the copper/polyimide thin-film multilayer (TFML) interconnections between chips. The circuit oscillated at 122 MHz without delay lines; delay lines in the circuit enabled measurement of 88 ps/cm propagation delay and -28 dB crosstalk between adjacent parallel lines. The measured electrical characteristics agreed with predictions obtained from static electrical models and SPICE simulations of the interconnections. The ring oscillator circuit has general applications for determining dynamic electrical characteristics of a variety of packaging structures, such as co-fired ceramic single-chip packages and tape-automated-bonding (TAB) leadframes.
Keywords
Dielectric films; Integrated circuit interconnections; Interconnections, Integrated circuits; Circuit testing; Copper; Electric variables; Integrated circuit interconnections; Logic testing; Nonhomogeneous media; Polyimides; Ring oscillators; Thin film circuits; Transistors;
fLanguage
English
Journal_Title
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
0148-6411
Type
jour
DOI
10.1109/TCHMT.1987.1134780
Filename
1134780
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