• DocumentCode
    951751
  • Title

    Electrical Characteristics of Copper/Polyimide Thin-Film Multilayer Interconnects

  • Author

    Lane, Thomas A. ; Belcourt, Frank J. ; Jensen, Ronald J.

  • Author_Institution
    Honeywell Physical Sciences Center,Bloomington
  • Volume
    10
  • Issue
    4
  • fYear
    1987
  • fDate
    12/1/1987 12:00:00 AM
  • Firstpage
    577
  • Lastpage
    585
  • Abstract
    A multilayer substrate Containing two-chip emitter-coupled logic (ECL) ring oscillator circuits was fabricated and tested to determine the static and dynamic electrical characteristics of the copper/polyimide thin-film multilayer (TFML) interconnections between chips. The circuit oscillated at 122 MHz without delay lines; delay lines in the circuit enabled measurement of 88 ps/cm propagation delay and -28 dB crosstalk between adjacent parallel lines. The measured electrical characteristics agreed with predictions obtained from static electrical models and SPICE simulations of the interconnections. The ring oscillator circuit has general applications for determining dynamic electrical characteristics of a variety of packaging structures, such as co-fired ceramic single-chip packages and tape-automated-bonding (TAB) leadframes.
  • Keywords
    Dielectric films; Integrated circuit interconnections; Interconnections, Integrated circuits; Circuit testing; Copper; Electric variables; Integrated circuit interconnections; Logic testing; Nonhomogeneous media; Polyimides; Ring oscillators; Thin film circuits; Transistors;
  • fLanguage
    English
  • Journal_Title
    Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0148-6411
  • Type

    jour

  • DOI
    10.1109/TCHMT.1987.1134780
  • Filename
    1134780