DocumentCode :
952358
Title :
Measurement arrangement for direct capacitance/surface-potential recording on m.o.s. capacitor
Author :
Ligtenberg, H.C.G. ; Snijder, J.
Author_Institution :
Groningen State University, Department of Applied Physics, Groningen, Netherlands
Volume :
15
Issue :
17
fYear :
1979
Firstpage :
523
Lastpage :
524
Abstract :
Using the slow-ramp C/V method as a starting point, a measuring method is developed to measure directly the total m.o.s. capacitance as a function of the surface potential. The advantages of this method are a greater accuracy and an easy way to compensate for leakage currents.
Keywords :
capacitance measurement; metal-insulator-semiconductor structures; MOS capacitor; direct capacitance/surface potential recording; measurement arrangement; slow ramp C/V method;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19790377
Filename :
4243498
Link To Document :
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