DocumentCode :
952477
Title :
Instrumentation for electron beam lithography
Author :
Chang, T.H.P.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY, USA
Volume :
10
Issue :
3
fYear :
1974
fDate :
9/1/1974 12:00:00 AM
Firstpage :
883
Lastpage :
887
Keywords :
Electron-beam fabrication; Magnetic bubble devices; Brightness; Electron beams; Electron optics; Guns; Instruments; Lanthanum; Lenses; Lithography; Optical sensors; Resists;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1974.1058450
Filename :
1058450
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=952477
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