DocumentCode :
953318
Title :
Effect of base dopants on the bias stress stability of AlGaAs/GaAs HBTs
Author :
Ahmad, Tohari ; Rezazadeh, Ali A. ; Gill, Sandeep Singh
Author_Institution :
Dept. of Electron. & Electr. Eng., London Univ., UK
Volume :
29
Issue :
19
fYear :
1993
Firstpage :
1725
Lastpage :
1726
Abstract :
The effect of three base dopants C, Be and Zn on the bias stress stability of npn AlGaAs/GaAs HBTs has been investigated for the first time. In this study 3*30 mu m2 HBTs were fabricated under identical process technology, emitter-base geometry and layout design. Following 24 h of identical bias stress, it is found that both Be- and Zn-doped devices exhibited current gain degradation as high as 68 and 57%, respectively, compared with only 7% for the C-doped device. The superior bias stress stability of C-doped HBTs is demonstrated.
Keywords :
III-V semiconductors; aluminium compounds; beryllium; carbon; gallium arsenide; heterojunction bipolar transistors; semiconductor doping; zinc; AlGaAs-GaAs; HBTs; base dopants; bias stress stability; current gain degradation; emitter-base geometry; layout design; process technology;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19931147
Filename :
237375
Link To Document :
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