DocumentCode :
953599
Title :
Use of trimethylantimony and trimethylarsenic for organometallic v.p.e. growth of GAAs1-ySby and Ga1-xInxAs
Author :
Cooper, C.B. ; Ludowise, M.J. ; Aebi, Verle ; Moon, R.L.
Author_Institution :
Varian Associates Inc., Corporate Solid State Laboratory, Palo Alto, USA
Volume :
16
Issue :
1
fYear :
1980
Firstpage :
20
Lastpage :
21
Abstract :
The use of trimethylarsenic and trimethylantimony as group V sources for the organometallic v.p.e. growth of GaAs1-ySby (0 ¿ y ¿ 0.11) and Ga1-xInxAs(x ¿ 0.29) is reported. No room-temperature reaction is observed between triethylindium and trimethylarsenic and the growths are made at ambient pressure with no special reactor modifications.
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; semiconductor technology; vapour phase epitaxial growth; Ga1-xInxAs; GaAs1-ySby; III-V semiconductors; group V sources; organometallic VPE; semiconductor technology; trimethyl As; trimethyl Sb;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19800017
Filename :
4243797
Link To Document :
بازگشت