DocumentCode :
953969
Title :
Thin-Film Titanium Dioxide Capacitors for Microelectronic Applications
Author :
Keister, F.Z.
Author_Institution :
Hughes Aircraft Company
Volume :
12
Issue :
1
fYear :
1965
fDate :
3/1/1965 12:00:00 AM
Firstpage :
16
Lastpage :
20
Abstract :
This paper discusses investigations of vacuum-deposited thin-film titanium dioxide capacitors applicable to microelectronic circuits. Included are sections covering evaporant materials and their purities, vacuum evaporation techniques, anodizing procedures, substrate materials, and electrical properties of thin-film TiO2capacitors.
Keywords :
Dielectrics; Dioxide; Evaporation; Films; Mircoelectronic; Titanium; Vacuum; Capacitors; Dielectric constant; Dielectric materials; Dielectric substrates; Dielectric thin films; Microelectronics; Optical films; Thin film circuits; Titanium; Transistors;
fLanguage :
English
Journal_Title :
Component Parts, IEEE Transactions on
Publisher :
ieee
ISSN :
0097-6601
Type :
jour
DOI :
10.1109/TCP.1965.1135086
Filename :
1135086
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=953969
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