DocumentCode :
954514
Title :
Electron-Beam-Induced Currents in Simple Device Structures
Author :
Galloway, Kenneth F. ; Leedy, Kathryn O. ; Keery, William J.
Author_Institution :
National Bureau of Standards,Washington,DC
Volume :
12
Issue :
3
fYear :
1976
fDate :
9/1/1976 12:00:00 AM
Firstpage :
231
Lastpage :
236
Abstract :
Electron-beam-induced current (EBIC) in semiconductor devices produced by the electron beam of a scanning electron microscope (SEM) can be used to image sub-surface device features and to measure certain material parameters, This paper presents a simple method of calculation for estimating the magnitude of EBIC signals. EBIC signals from silicon p-n junction diodes are compared with the results of the calculation, The application of EBIC to more complicated device structures is discussed.
Keywords :
Electron-beam applications; Scanning electron microscopy; Semiconductor device measurements; Semiconductor materials measurements; Circuits; Conducting materials; Electron beams; Electronic components; NIST; P-n junctions; Scanning electron microscopy; Semiconductor diodes; Semiconductor materials; Silicon;
fLanguage :
English
Journal_Title :
Parts, Hybrids, and Packaging, IEEE Transactions on
Publisher :
ieee
ISSN :
0361-1000
Type :
jour
DOI :
10.1109/TPHP.1976.1135138
Filename :
1135138
Link To Document :
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