DocumentCode :
955042
Title :
Role of substrate in electrical properties of GaAs implanted layers
Author :
Martin, G.M. ; Berth, M. ; Venger, C.
Author_Institution :
Laboratoires d´Electronique et de Physique Appliquée, Limeil Brévannes, France
Volume :
16
Issue :
8
fYear :
1980
Firstpage :
278
Lastpage :
279
Abstract :
The variation of implantation efficiency in different semi-insulating GaAs materials is shown to be correlated with he purity of the starting substrate, i.e. its Cr concentration and more especially its value of ND¿NA (shallow levels). This last value appears to be a key parameter in the electrical properties of implanted layers.
Keywords :
III-V semiconductors; gallium arsenide; ion implantation; semiconductor doping; Cr concentration; GaAs implanted layers; ND-NA value effects; electrical properties; ion implantation efficiency variation; semi-insulating GaAs materials; substrate role;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19800203
Filename :
4243968
Link To Document :
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