Title :
New Method in Fabrication of Tantalum Thin-Film Integrated Circuits
Author :
Miwa, Ichiro ; Nishimura, Takeo
Author_Institution :
Hitachi Ltd.
fDate :
6/1/1965 12:00:00 AM
Abstract :
A simple and accurate method in fabrication of tantalum thin-film integrated circuits was developed. In that, after the sheet resistivity of deposited film is adjusted by anodizing its surface, photolithographic processes are carried out successively.
Keywords :
Etching; Fabrication; IC (Integrated circuits); Integrated circuits; Photolithography; Tantalum; Tantalum oxide; Thin films; Capacitors; Conductive films; Conductivity; Dielectric thin films; Etching; Fabrication; Resistors; Substrates; Surface resistance; Thin film circuits;
Journal_Title :
Parts, Materials and Packaging, IEEE Transactions on
DOI :
10.1109/TPMP.1965.1135377
