DocumentCode
957498
Title
A High-Stability RC Circuit Using High Nitrogen Doped Tantalum
Author
Duff, O.J. ; Koerckel, Gerard J. ; Mayer, Edward H. ; Worobey, Walter
Author_Institution
Western Electric Company,MA
Volume
2
Issue
2
fYear
1979
fDate
6/1/1979 12:00:00 AM
Firstpage
221
Lastpage
225
Abstract
A fabrication process and reliability studies for RC hybrid integrated circuits utilizing alpha tantalum capacitors and tantalum nitride resistors are described. The alpha tantalum used in this study was reactively sputtered tantalum film containing from 10-20 atomic percent nitrogen and has a body centered cubic structure. The ac and dc characteristics of the alpha tantalum capacitors are in agreement with those shown by Anders and Rottersman [5], [6]. The longterm thermal stability of these capacitors is shown to be at least three times better than for beta tantalum capacitors. Accelerated life tests at various voltages show the alpha tantalum RC circuits to be at least equivalent in reliability to those using standard beta tantalum capacitors. The RC product shows excellent temperature compensation and stability during accelerated parametric aging tests which were done on production RC filter circuits.
Keywords
RC filters; Tantalum alloys/compounds, devices; Tantalum devices; Thin-film circuit reliability; Capacitors; Circuit stability; Circuit testing; Fabrication; Hybrid integrated circuits; Integrated circuit reliability; Life estimation; Nitrogen; Resistors; Thermal stability;
fLanguage
English
Journal_Title
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
0148-6411
Type
jour
DOI
10.1109/TCHMT.1979.1135446
Filename
1135446
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