• DocumentCode
    957498
  • Title

    A High-Stability RC Circuit Using High Nitrogen Doped Tantalum

  • Author

    Duff, O.J. ; Koerckel, Gerard J. ; Mayer, Edward H. ; Worobey, Walter

  • Author_Institution
    Western Electric Company,MA
  • Volume
    2
  • Issue
    2
  • fYear
    1979
  • fDate
    6/1/1979 12:00:00 AM
  • Firstpage
    221
  • Lastpage
    225
  • Abstract
    A fabrication process and reliability studies for RC hybrid integrated circuits utilizing alpha tantalum capacitors and tantalum nitride resistors are described. The alpha tantalum used in this study was reactively sputtered tantalum film containing from 10-20 atomic percent nitrogen and has a body centered cubic structure. The ac and dc characteristics of the alpha tantalum capacitors are in agreement with those shown by Anders and Rottersman [5], [6]. The longterm thermal stability of these capacitors is shown to be at least three times better than for beta tantalum capacitors. Accelerated life tests at various voltages show the alpha tantalum RC circuits to be at least equivalent in reliability to those using standard beta tantalum capacitors. The RC product shows excellent temperature compensation and stability during accelerated parametric aging tests which were done on production RC filter circuits.
  • Keywords
    RC filters; Tantalum alloys/compounds, devices; Tantalum devices; Thin-film circuit reliability; Capacitors; Circuit stability; Circuit testing; Fabrication; Hybrid integrated circuits; Integrated circuit reliability; Life estimation; Nitrogen; Resistors; Thermal stability;
  • fLanguage
    English
  • Journal_Title
    Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0148-6411
  • Type

    jour

  • DOI
    10.1109/TCHMT.1979.1135446
  • Filename
    1135446