DocumentCode
957813
Title
Power integrated circuits-progress, prospects and challenges
Author
Mukherjee, Sayan
Author_Institution
North American Philips Corp., Briarcliff Manor, NY, USA
Volume
36
Issue
11
fYear
1989
fDate
11/1/1989 12:00:00 AM
Firstpage
2599
Lastpage
2600
Abstract
Summary form only given. PICs (power integrated circuits) are defined as ICs combining high-voltage and/or high-current components monolithically with low-voltage/low-current control components. Broadly, three classes of technologies, based on the techniques for isolating the high- and low-voltage components, have been developed for PICs: junction-isolated, self-isolated and dielectrically isolated. Each of these technologies has found its way into applications that result in optimal performance per unit cost. Simultaneously with the development of technologies, several advancements have been made in high-voltage/power devices suitable for integration. These included the reduced surface field lateral double diffused MOS transistor (RESURF LDMOS), the isolated vertical DMOS (VDMOS), the lateral insulated gate bipolar transistor (LIGBT), the high-voltage RESURF bipolar transistors, the Schottky injection FET (SINFET), and the trench sidewall channel DMOS (TDMOS). Innovative device designs like the LIGBT have resulted in die sizes reduced by a factor of 3 to 5 and therefore in lower cost. In high-current applications, trench-based power devices are being developed for silicon die size reduction by more than a factor of 2. Additionally, with high-density control sections and cell-library-based automated design methods, custom ASIC (application-specific IC) designs are being developed rapidly at lower cost.
Keywords
integrated circuit technology; power integrated circuits; LIGBT; PICs; RESURF LDMOS; SINFET; Schottky injection FET; TDMOS; VDMOS; application-specific IC; cell-library-based automated design; custom ASIC; die size reduction; dielectric isolation; dielectrically isolated; high-current ICs; high-current applications; high-density control sections; high-voltage ICs; high-voltage RESURF bipolar transistors; isolated vertical DMOS; junction isolation; junction-isolated; lateral insulated gate bipolar transistor; optimal performance per unit cost; power integrated circuits; reduced surface field lateral double diffused MOS transistor; self-isolated; self-isolation; trench sidewall channel DMOS; trench-based power devices; Application specific integrated circuits; Cost function; Dielectrics; Double-gate FETs; Insulated gate bipolar transistors; Integrated circuit technology; Isolation technology; MOSFETs; Power integrated circuits; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.43689
Filename
43689
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