DocumentCode :
958054
Title :
Self-Assembly for Semiconductor Industry
Author :
Lu, Wei ; Sastry, Ann Marie
Author_Institution :
Univ. of Michigan, Ann Arbor
Volume :
20
Issue :
4
fYear :
2007
Firstpage :
421
Lastpage :
431
Abstract :
Fabrication technologies for the semiconductor industry have enabled ever-smaller devices but now face fundamental limits in creating nanoscale products. Self-assembly has recently emerged as a promising alternative fabrication technology for functional nanoscale systems. Such processes can be made parallel and are capable of producing three-dimensional structures with ~10 nm precision. This paper reviews developments, applications and challenges of self-assembly methods for the semiconductor industry. Although a fully self-assembled nanoscale system has not yet been commercially achieved, the work reviewed and discussed here demonstrates a solid scientific foundation in pursuing this goal.
Keywords :
nanolithography; self-assembly; semiconductor device manufacture; fabrication technologies; field guidance; functional nanoscale systems; lithography; self-assembly; semiconductor industry; semiconductor manufacturing; Costs; Electronics industry; Fabrication; Integrated circuit technology; Lithography; Manufacturing; Nanofabrication; Optical imaging; Self-assembly; Substrates; Field guidance; lithography; self-assembly; semiconductor manufacturing;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2007.907622
Filename :
4369344
Link To Document :
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