• DocumentCode
    958383
  • Title

    High performance single and multiple quantum well InGaAs/InP lasers

  • Author

    Tanbun-Ek, T. ; Temkin, H. ; Logan, R.A.

  • Author_Institution
    AT&T Bell Labs., Murray Hill, NJ, USA
  • Volume
    36
  • Issue
    11
  • fYear
    1989
  • fDate
    11/1/1989 12:00:00 AM
  • Firstpage
    2606
  • Abstract
    Summary form only given. The authors report a simple technique which leads to reproducible preparation of low threshold current single- and multiple-quantum-well (SQW and MQW) lasers. Separate confinement SQW and MQW lasers were grown by atmospheric pressure MOVPE (metal-organic vapor-phase epitaxy). The active region consists of 10-15-nm InGaAs well(s) cladded by a 50-nm-thick InGaAsP (Eg=0.84 eV) waveguide layer. High-quality device structures were prepared by a novel interlayer growth technique where a thin layer of InP was introduced at the QW-barrier interface. Both SCH-SQW and MQW lasers show threshold current densities of approximately 2 kA/cm2 in 250- mu m-long devices. Polarized photocurrent response measurements of the laser waveguides show well-resolved heavy (TE) and light (TM) hole excitons. Lasing occurs at the heavy hole exciton energy of approximately 1.55 mu m, clearly indicating a quantum size effect.
  • Keywords
    III-V semiconductors; gallium arsenide; indium compounds; optical waveguides; semiconductor growth; semiconductor junction lasers; semiconductor quantum wells; vapour phase epitaxial growth; 1.55 micron; III-V semiconductors; InGaAs-InP; MQW; SCH type; SQW; TE hole excitons; TM hole excitons; atmospheric pressure MOVPE; interlayer growth technique; low threshold current; metal-organic vapor-phase epitaxy; multiple quantum well; semiconductor lasers; single quantum well; waveguide layer; Atmospheric waves; Epitaxial growth; Epitaxial layers; Excitons; Indium gallium arsenide; Indium phosphide; Quantum well devices; Quantum well lasers; Threshold current; Waveguide lasers;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.43708
  • Filename
    43708