DocumentCode
958973
Title
Automatic LSI Wafer Dry-Point Detection and Control System
Author
Smith, E. George
Author_Institution
IBM Corporation,VA
Volume
3
Issue
1
fYear
1980
fDate
3/1/1980 12:00:00 AM
Firstpage
196
Lastpage
198
Abstract
An automatic means is presented for determining when a semiconductor wafer is sufficiently dry (on the product surface) to allow removal from the present processing station for transportation to the next processing point.
Keywords
Integrated circuit fabrication; Process control; Automatic control; Control systems; Face detection; Large scale integration; Light sources; Reflectivity; Surface emitting lasers; Throughput; Transportation; Voltage;
fLanguage
English
Journal_Title
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
0148-6411
Type
jour
DOI
10.1109/TCHMT.1980.1135601
Filename
1135601
Link To Document