Title :
Automatic LSI Wafer Dry-Point Detection and Control System
Author :
Smith, E. George
Author_Institution :
IBM Corporation,VA
fDate :
3/1/1980 12:00:00 AM
Abstract :
An automatic means is presented for determining when a semiconductor wafer is sufficiently dry (on the product surface) to allow removal from the present processing station for transportation to the next processing point.
Keywords :
Integrated circuit fabrication; Process control; Automatic control; Control systems; Face detection; Large scale integration; Light sources; Reflectivity; Surface emitting lasers; Throughput; Transportation; Voltage;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
DOI :
10.1109/TCHMT.1980.1135601
