Title :
Heat Transfer of Modified Silicon Surfaces
Author :
Reeber, Morton D. ; Frieser, Rudolf G.
Author_Institution :
IBM Data Systems Div.
fDate :
9/1/1980 12:00:00 AM
Abstract :
The heat transfer between silicon surfaces and perfluorohexane has been measured for fluxes ranging from 0 to 2.2 W/cm2. Data are presented for ten different surface treatments designed to encourage thermal nucleation.
Keywords :
Semiconductor device packaging; Semiconductor device thermal factors; Silicon; Chemicals; Heat sinks; Heat transfer; Rough surfaces; Silicon; Solids; Surface cleaning; Surface roughness; Surface treatment; Temperature measurement;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
DOI :
10.1109/TCHMT.1980.1135627
