Title :
Novel Process for Fabricating Nichrome-Aluminum Film Resistor Networks
Author_Institution :
CEERI,Pilani,India
fDate :
9/1/1980 12:00:00 AM
Abstract :
A novel process for the fabrication of nichrome-aluminium based thin-film resistor networks on glass plates is described. The process uses only an aluminium etchant, and it can also be used with a cermet-aluminium film system. Various advantages of the process are pointed out.
Keywords :
Aluminum devices; Chromium alloys/compounds, devices; Iron alloys/compounds, devices; Nickel alloys/compounds, devices; Thin-film resistor fabrication; Aluminum; Ceramics; Conductive films; Etching; Glass; Resistors; Resists; Substrates; Temperature; Transistors;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
DOI :
10.1109/TCHMT.1980.1135633
