DocumentCode
959598
Title
Influence of the dislocation density on the performance of heteroepitaxial indium phosphide solar cells
Author
Jain, Raj K. ; Flood, Dennis J.
Author_Institution
NASA Lewis Res. Center, Cleveland, OH, USA
Volume
40
Issue
11
fYear
1993
fDate
11/1/1993 12:00:00 AM
Firstpage
1928
Lastpage
1934
Abstract
The authors point out that heteroepitaxial indium phosphide solar cells developed to date have low efficiency due to misfit dislocations. Dislocations act as recombination centers and strongly influence the solar cell performance. Calculations have been made to study the dependence of heteroepitaxial InP solar cell efficiency on dislocation density. The effects of surface recombination velocity and cell emitter thickness are also considered. Calculated results are compared with the available experimental results on representative InP solar cells. It is shown that heteroepitaxial InP cells with over 20% AM0 efficiency could be fabricated if dislocation density can be reduced to <105 cm-2 and the surface recombination velocity reduced to <105 cm/s
Keywords
III-V semiconductors; carrier lifetime; dislocation density; electron-hole recombination; indium compounds; minority carriers; solar cells; vapour phase epitaxial growth; 20 percent; AM0 efficiency; InP-InGaAs-GaAs; MOCVD growth; cell emitter thickness; dislocation density; heteroepitaxial InP solar cell; minority carrier diffusion length; misfit dislocations; recombination centers; solar cell performance; surface recombination velocity; Buffer layers; Floods; Gallium arsenide; Helium; Indium phosphide; Lattices; MOCVD; Photovoltaic cells; Silicon; Substrates;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.239730
Filename
239730
Link To Document