• DocumentCode
    959598
  • Title

    Influence of the dislocation density on the performance of heteroepitaxial indium phosphide solar cells

  • Author

    Jain, Raj K. ; Flood, Dennis J.

  • Author_Institution
    NASA Lewis Res. Center, Cleveland, OH, USA
  • Volume
    40
  • Issue
    11
  • fYear
    1993
  • fDate
    11/1/1993 12:00:00 AM
  • Firstpage
    1928
  • Lastpage
    1934
  • Abstract
    The authors point out that heteroepitaxial indium phosphide solar cells developed to date have low efficiency due to misfit dislocations. Dislocations act as recombination centers and strongly influence the solar cell performance. Calculations have been made to study the dependence of heteroepitaxial InP solar cell efficiency on dislocation density. The effects of surface recombination velocity and cell emitter thickness are also considered. Calculated results are compared with the available experimental results on representative InP solar cells. It is shown that heteroepitaxial InP cells with over 20% AM0 efficiency could be fabricated if dislocation density can be reduced to <105 cm-2 and the surface recombination velocity reduced to <105 cm/s
  • Keywords
    III-V semiconductors; carrier lifetime; dislocation density; electron-hole recombination; indium compounds; minority carriers; solar cells; vapour phase epitaxial growth; 20 percent; AM0 efficiency; InP-InGaAs-GaAs; MOCVD growth; cell emitter thickness; dislocation density; heteroepitaxial InP solar cell; minority carrier diffusion length; misfit dislocations; recombination centers; solar cell performance; surface recombination velocity; Buffer layers; Floods; Gallium arsenide; Helium; Indium phosphide; Lattices; MOCVD; Photovoltaic cells; Silicon; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.239730
  • Filename
    239730