DocumentCode
959630
Title
Monte Carlo analysis of nonequilibrium electron transport in InAlGaAs/InGaAs HBT´s
Author
Nakajima, Hiroki ; Ishibashi, Tadao
Author_Institution
NTT LSI Labs., Kanagawa, Japan
Volume
40
Issue
11
fYear
1993
fDate
11/1/1993 12:00:00 AM
Firstpage
1950
Lastpage
1956
Abstract
A Monte Carlo analysis of nonequilibrium electron transport in InAlGaAs/InGaAs HBTs is discussed. The discussion focuses on hot electron transport in a heavily doped p-type base from the viewpoint of high-speed transistor performance. Simulation shows that a hybrid base structure which incorporates an abrupt emitter/base junction and a graded base layer has a shorter base transit time than conventional uniform base structures with an abrupt emitter or fully graded base structures. The short base transit time is due to the high initial electron velocity provided by the abrupt emitter/base junction and the acceleration of energy-relaxed electrons (which cause a lowering of average electron velocity in the base region) by a built-in electric field in the graded base layer. The influence of hot electron injection into the collector is also considered
Keywords
III-V semiconductors; Monte Carlo methods; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; hot carriers; indium compounds; semiconductor device models; HBTs; InAlGaAs-InGaAs; Monte Carlo analysis; abrupt emitter/base junction; base transit time; built-in electric field; graded base layer; heavily doped p-type base; high-speed transistor performance; hot electron transport; hybrid base structure; initial electron velocity; nonequilibrium electron transport; Acceleration; Bipolar transistors; Electron emission; Gallium arsenide; Heterojunction bipolar transistors; Hybrid junctions; Indium gallium arsenide; Monte Carlo methods; Region 4; Secondary generated hot electron injection;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.239733
Filename
239733
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