Title :
Visible (639 nm ⩽λ⩽661 nm) vertical cavity surface emitting laser diodes
Author :
Lott, James A. ; Schneider, R.P.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM
fDate :
11/1/1993 12:00:00 AM
Abstract :
Summary form only given. The demonstration ofInAlGaP visible VCSEL (vertical cavity surface emitting laser) diodes is reported. The structures were grown by MOVPE (metalorganic vapor-phase epitaxy) on GaAs substrates and consist of an InAlGaP optical cavity active region surrounded by AlGaAs DBRs (distributed Bragg reflectors). Gain-guided `etched post´ test devices were fabricated. A top annulus contact defines emitting diameters of 10 μm and 20 μm with a 5 μm radial thickness; thus, a large percentage of the injected current does not directly contribute to lasing but to device heating. Despite this, lasing wavelengths from 639.1 nm to 660.7 nm were measured on unrotated wafers, at room temperature without heat sinking. The pulsed excitation was ~100 ns pulses at 10 kHz to 1 MHz. Many devices continued lasing with up to a 40% duty cycle at 1 MHz. The larger devices typically have a threshold of 30 mA at 2.7 V. The peak output power is 3.38 mW with a resistance of less than 15 Ω
Keywords :
III-V semiconductors; aluminium compounds; distributed Bragg reflector lasers; gallium compounds; indium compounds; laser cavity resonators; laser transitions; semiconductor lasers; vapour phase epitaxial growth; 1 kHz to 1 MHz; 10 micron; 100 ns; 15 ohm; 20 micron; 3.38 mW; 30 mA; 5 micron; 639 to 661 nm; AlGaAs; AlGaAs DBRs; GaAs substrates; InAlGaP; MOVPE; distributed Bragg reflectors; metalorganic vapor-phase epitaxy; pulsed excitation; surface emitting laser diodes; top annulus contact; vertical cavity; visible VCSEL; Diodes; Distributed Bragg reflectors; Epitaxial growth; Epitaxial layers; Gallium arsenide; Optical surface waves; Stimulated emission; Substrates; Surface emitting lasers; Vertical cavity surface emitting lasers;
Journal_Title :
Electron Devices, IEEE Transactions on