DocumentCode :
960369
Title :
Electroosmotic pumps fabricated from porous silicon membranes
Author :
Yao, Shuhuai ; Myers, Alan M. ; Posner, Jonathan D. ; Rose, Klint A. ; Santiago, Juan G.
Author_Institution :
Dept. of Mech. Eng., Stanford Univ., CA, USA
Volume :
15
Issue :
3
fYear :
2006
fDate :
6/1/2006 12:00:00 AM
Firstpage :
717
Lastpage :
728
Abstract :
N-type porous silicon can be used to realize electroosmotic pumps with high flow rates per applied potential difference. The porosity and pore size of porous silicon membranes can be tuned, the pore geometry has near-unity tortuosity, and membranes can be made thin and with integrated support structures. The size of hexagonally packed pores is modified by low-pressure chemical vapor deposition (LPCVD) polysilicon deposition, followed by wet oxidation of the polysilicon layer, resulting in a pore radius varying from 1 to 3 μm. Pumping performance of these devices is experimentally studied as a function of pore size and compared with theory. These 350-μm-thick silicon membranes exhibit a maximum flow rate per applied field of 0.13 ml/min/cm2/V. This figure of merit is five times larger than previously demonstrated porous glass EO pumps.
Keywords :
chemical vapour deposition; electrophoresis; elemental semiconductors; microfluidics; micropumps; porous semiconductors; silicon; 1 to 3 micron; 350 micron; N-type porous silicon; electroosmotic pumps; hexagonally packed pores; low-pressure chemical vapor deposition; polysilicon deposition; polysilicon layer; pore geometry; pore size; porosity; porous silicon membranes; wet oxidation; Biomembranes; Chemical vapor deposition; Geometry; Glass; Mechanical engineering; Oxidation; Permittivity; Pump lasers; Silicon; Voltage; Electroosmotic pump; porous silicon membrane; zeta potential;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2006.876796
Filename :
1638499
Link To Document :
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