• DocumentCode
    960371
  • Title

    Numerical simulations of on and off state characteristics of polysilicon thin film transistors

  • Author

    Hack, Michel ; Wu, I.-W. ; Lewis, A.G. ; King, Thomas J.

  • Author_Institution
    Xerox Palo Alto Res. Center, CA
  • Volume
    40
  • Issue
    11
  • fYear
    1993
  • fDate
    11/1/1993 12:00:00 AM
  • Firstpage
    2128
  • Abstract
    Summary form only given. Good agreement between numerical simulations and experimental data on the electrical characteristics of polycrystalline silicon (poly-Si) thin film transistors (TFTs) is shown. The field-effect mobility, threshold voltage, leakage current, and kink effect are examined. It is shown how the on-state performance of these devices can be modeled using an effective medium approach. Leakage currents are modeled by adding a single tunneling trap with a temperature-independent tunneling mechanism. The bias, temperature, and statistical behavior of leakage currents in poly-Si TFTs have been successfully simulated
  • Keywords
    carrier mobility; elemental semiconductors; semiconductor device models; silicon; thin film transistors; tunnelling; electrical characteristics; field-effect mobility; kink effect; leakage current; leakage currents; on and off state characteristics; on-state performance; polysilicon thin film transistors; single tunneling trap; statistical behavior; temperature-independent tunneling mechanism; threshold voltage; Computer hacking; Electric variables; Electron devices; Grain boundaries; Leakage current; Numerical simulation; Temperature dependence; Thin film transistors; Threshold voltage; Tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.239807
  • Filename
    239807