DocumentCode :
960371
Title :
Numerical simulations of on and off state characteristics of polysilicon thin film transistors
Author :
Hack, Michel ; Wu, I.-W. ; Lewis, A.G. ; King, Thomas J.
Author_Institution :
Xerox Palo Alto Res. Center, CA
Volume :
40
Issue :
11
fYear :
1993
fDate :
11/1/1993 12:00:00 AM
Firstpage :
2128
Abstract :
Summary form only given. Good agreement between numerical simulations and experimental data on the electrical characteristics of polycrystalline silicon (poly-Si) thin film transistors (TFTs) is shown. The field-effect mobility, threshold voltage, leakage current, and kink effect are examined. It is shown how the on-state performance of these devices can be modeled using an effective medium approach. Leakage currents are modeled by adding a single tunneling trap with a temperature-independent tunneling mechanism. The bias, temperature, and statistical behavior of leakage currents in poly-Si TFTs have been successfully simulated
Keywords :
carrier mobility; elemental semiconductors; semiconductor device models; silicon; thin film transistors; tunnelling; electrical characteristics; field-effect mobility; kink effect; leakage current; leakage currents; on and off state characteristics; on-state performance; polysilicon thin film transistors; single tunneling trap; statistical behavior; temperature-independent tunneling mechanism; threshold voltage; Computer hacking; Electric variables; Electron devices; Grain boundaries; Leakage current; Numerical simulation; Temperature dependence; Thin film transistors; Threshold voltage; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.239807
Filename :
239807
Link To Document :
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