Title :
Excimer-laser crystallized poly-Si TFTs with mobility of more than 600 cm2/Vs
Author :
Choi, Dae Hyun ; Sugiura, O. ; Matsumura, Mieko
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol.
fDate :
11/1/1993 12:00:00 AM
Abstract :
Summary form only given. The authors present excimer-laser-crystallized poly-Si TFTs (thin-film transistors) with a field-effect mobility of greater than 600 cm2/Vs, which is more than 50% higher than the best value reported to date. The TFT structure, the novel process, and the mechanism for the superior TFT performances are discussed. The results obtained indicate that reduction of heat removal rate from the molten Si layer during an excimer-laser-crystallization step is a key way to improve the performance of poly-Si TFTs on a glass substrate
Keywords :
carrier mobility; excimer lasers; laser beam applications; semiconductor technology; thin film transistors; excimer-laser-crystallization step; excimer-laser-crystallized poly-Si TFTs; field-effect mobility; glass substrate; heat removal rate; Conductivity; Crystallization; MOSFETs; Photonic band gap; Rectifiers; Temperature; Thin film transistors; Thyristors; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on
