DocumentCode :
960459
Title :
Room-temperature operation of InGaAs-based hot-electron transistors
Author :
Moise, T.S. ; Seabaugh, A.C. ; Beam, E.A. ; Kao, Y.-C. ; Randall, J.N.
Author_Institution :
Texas Instrum. Inc., Dallas, TX
Volume :
40
Issue :
11
fYear :
1993
fDate :
11/1/1993 12:00:00 AM
Firstpage :
2134
Abstract :
Summary form only given. It is demonstrated that 300-K operation of an InGaAs-based HET (hot-electron transistor) can be achieved by further increasing the electron injection energy in combination with the use of a wide-bandgap base-collector isolation barrier. The characteristics of a device consisting of an InAlAs emitter, a 10-Å AlAs tunnel-barrier positioned at the emitter-base heterojunction, a 400-Å n+ InGaAs base region, and a 2500-Å InAlGaAs collector barrier are reported. The injected electrons are transported across the base region with over 80% efficiency, as measured in a common-base configuration. The maximum common-emitter current gain in this nonoptimized transistor is nearly four with an fT of over 40 GHz and a base-collector breakdown voltage of 1.5 V. A systematic study of RHET (resonant tunneling HET) injector and collection properties indicates that the HET can operate at room temperature with a current gain on the order of 100. 300-K operation of a single-RHET, exclusive-NOR integrated circuit that is similar in design to the one demonstrated at 77 K by N. Yokoyama et al. (1985) is also shown
Keywords :
electric breakdown of solids; gallium arsenide; hot electron transistors; indium compounds; logic devices; 300 K; HET; InGaAs-based hot-electron transistors; RHET; base-collector breakdown voltage; collector barrier; common-base configuration; current gain; electron injection energy; exclusive-NOR integrated circuit; maximum common-emitter current gain; tunnel-barrier; wide-bandgap base-collector isolation barrier; Breakdown voltage; Circuits; Current measurement; Electrons; Gain measurement; Indium gallium arsenide; Performance gain; Scattering; Temperature; Transistors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.239817
Filename :
239817
Link To Document :
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