DocumentCode
960984
Title
Properties of superconducting weak links prepared by ion implantation and by electron beam lithography
Author
Harris, E.P. ; Laibowitz, R.B.
Author_Institution
IEEE TMAG
Volume
13
Issue
1
fYear
1977
fDate
1/1/1977 12:00:00 AM
Firstpage
724
Lastpage
730
Abstract
In this paper, we present our latest results on the properties of superconducting weak links prepared in Mo films by ion-implantation and in Nb films by electron-beam lithography. In the case of the ion-implanted weak links, which structurally resemble proximity-effect bridges, we find that the static properties are quite well described by a recent theory of Likharev and Yakobson. We further find that the rf response of these weak links is in excellent agreement with quasistatic resistively-shunted-junction model calculations based on a sinusoidal current-phase relation at those temperatures for which such a current-phase relation is predicted by the static theory of Likharev and Yakob-son. For the e-beam fabricated Nb bridges, which have the Dayem bridge geometry, our sample preparation techniques have allowed us to produce bridges and two-junction interferometers in which the link dimensions are as small as about 2000 Angstroms. We find that Josephson effects are observable in these bridges even when the bridge dimensions exceed the temperature-dependent coherence length by about an order of magnitude, but are still less than the effective thin-film penetration depth.
Keywords
Electron radiation effects; Ion implantation; Josephson devices; Bridges; Electron beams; Geometry; Interferometers; Ion implantation; Lithography; Niobium; Predictive models; Superconducting films; Temperature;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1977.1059315
Filename
1059315
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