DocumentCode
961993
Title
An extremely abrupt switching phenomenon in small-dimension polysilicon TFT structures with enhanced grain size
Author
Yamauchi, N. ; Hajjar, J.-J.J. ; Reif, R.
Author_Institution
MIT, Cambridge, MA, USA
Volume
36
Issue
11
fYear
1989
fDate
11/1/1989 12:00:00 AM
Firstpage
2623
Lastpage
2624
Abstract
Summary form only given. In the course of exploring the transfer characteristics in small-dimensional polysilicon TFTs (thin-film transistors), the authors found an extremely abrupt drain current change which cannot be explained by the existing TFT models. The measured devices are coplanar-type, n-channel polysilicon TFTs with channel widths and lengths, W and L, ranging from 20 mu m to half a micrometer. The authors measured the (drain current)-(gate voltage) characteristics in TFTs with various L and W applying a drain voltage of 5.0 V. It was found that the subthreshold slope became steeper as the channel dimension was reduced. The TFTs with dimensions smaller than 1.5 mu m showed transfer characteristics which were qualitatively different from those observed in the larger-dimension TFTs. In the TFT with W=L=0.5 mu m, the drain current changed from 50 pA to 15 mu A, corresponding to the gate voltage change of 40 mV. It is suggested that the observed switching phenomenon in the small-dimension TFTs may be related to avalanche-type breakdown at the grain boundary potential barrier, the height and width of which can be controlled by the gate voltage.
Keywords
elemental semiconductors; grain size; silicon; switching; thin film transistors; 0.5 to 20 micron; 5 V; 50 pA to 15 muA; Si; abrupt switching phenomenon; avalanche-type breakdown; channel length; channel widths; coplanar n-channel TFT; drain current change; drain voltage; enhanced grain size; gate voltage; grain boundary potential barrier; polysilicon TFT structures; subthreshold slope; transfer characteristics; Breakdown voltage; Capacitance; Conductivity; Current measurement; Doping; Electric resistance; Grain boundaries; Grain size; Implants; Length measurement; P-n junctions; Semiconductor process modeling; Surface resistance; Thin film transistors; Threshold voltage; Voltage control;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.43747
Filename
43747
Link To Document