DocumentCode :
962143
Title :
Device Modeling for Submicron FET Integrated Circuits
Author :
Chatterjee, Pallab K.
Author_Institution :
Texas Instruments, Inc., Dallas, TX, USA
Volume :
5
Issue :
1
fYear :
1982
fDate :
3/1/1982 12:00:00 AM
Firstpage :
122
Lastpage :
126
Abstract :
Phys!cal understanding of submicron device phenomena is key to the efficient use of these structures in circuit applications and to the invention of new device structures and concepts. Modeling activities are categorized in hierarchical levels of abstraction which extends the concept of hierarchical system simulation down to the fundamental levels of process modeling. Major emphasis in field-effect transistor (FET) modeling beyond the micron dimension is on the incorporation of geometry effects and high field transport on active devices. As geometry sizes shrink, the effects of both carrier types become important even in unipolar devices. For very large-scale integrated (VLSI) circuits at these geometries modeling of parasitic devices like interconnections and isolation are important in determining circuit operation and performance.
Keywords :
FET integrated circuits; Circuit simulation; FET integrated circuits; Fabrication; Geometry; Integrated circuit modeling; Poisson equations; Semiconductor process modeling; Silicon; Solid modeling; Very large scale integration;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/TCHMT.1982.1135930
Filename :
1135930
Link To Document :
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