Title :
Ultraviolet emission from OH and ArD in microcavity plasma devices
Author :
Ricconi, B.J. ; Park, S.-J. ; Sung, S.H. ; Tchertchian, P.A. ; Eden, J.G.
Author_Institution :
Univ. of Illinois, Urbana
Abstract :
Intense emission in the ultraviolet (250-400 nm) from OH (A2Sigma+) and the rare gas-deuteride excimer ArD has been observed from mixtures of H2O vapour or D2 in Ar and excited in microcavity plasma devices. Peak wavelength-integrated intensities are measured for H2O and D2 concentrations of ~0.16% and 0.5-1%, respectively. Spectral simulations indicate the OH (A2Sigma+, v´ = 0) rotational temperature to be 440 plusmn 20 K for 600 Torr Ar/0.3 Torr H2O mixtures excited in a 45 nL microcavity.
Keywords :
argon compounds; deuterium; excimers; gas mixtures; microcavities; oxygen compounds; plasma collision processes; plasma devices; water; ArD; ArD ultraviolet emission; D2; H2O; OH; OH ultraviolet emission; intense ultraviolet emission; microcavity plasma devices; pressure 0.3 torr; pressure 600 torr; rare gas-deuteride excimer; rotational temperature; water-deuterium gas mixture; wavelength 250 nm to 400 nm;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20071673
